TWINSCAN™ XT:1700i
The XT:1700i with HydroLith immersion technology delivers the world’s first 1.2 hyper NA for high-volume manufacturing at the 45-nm node. This innovative lithography system leverages TWINSCAN dual stages and an advanced, in-line catadioptric lens to deliver unrivalled resolution, depth of focus, overlay and productivity at an industry-leading 122 wafers per hour.
This fourth generation ASML immersion system provides a low-risk path to immersion techniques that improve yield and device performance. In fact, ASML immersion systems are already up and running on three continents, and to date, two leading manufacturers have announced first silicon using ASML’s HydroLith technology. The XT:1700i puts you at the forefront of developments that will take optical lithography to 45 nm.
Lens Field Size Overlay Throughput
NA Resolution X & Y 2 pt. Global
Alignment 300 mm Wafers
125 Exp., 30 mJ/cm2
1.2 < 50 nm 26 X 33 mm < 7 nm > 122 wph
